The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2009
Filed:
May. 11, 2007
Leo Mathew, Austin, TX (US);
Ross E. Noble, Austin, TX (US);
Raghaw S. Rai, Austin, TX (US);
Freescale Semiconductor, Inc., Austin, TX (US);
Abstract
A method for depositing metals on surfaces is provided which comprises (a) providing a substrate () having a horizontal surface () and a vertical surface (); (b) depositing a first metal layer () over the horizontal and vertical surfaces; (c) depositing a layer of polysilicon () over the horizontal and vertical surfaces; (d) treating the layer of polysilicon with a plasma such that a residue () remaining from the treatment is preferentially formed over the horizontal surfaces rather than the vertical surfaces, and wherein the residue is resistant to a first metal etch; and (e) exposing the substrate to the first metal etch.