The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2009
Filed:
Aug. 30, 2007
Chan-wook Baik, Yongin-si, KR;
Yong-wan Jin, Yongin-si, KR;
Gun-sik Park, Seoul, KR;
Jong-min Kim, Yongin-si, KR;
Young-min Shin, Seoul, KR;
Jin-kyu SO, Seoul, KR;
Chan-wook Baik, Yongin-si, KR;
Yong-wan Jin, Yongin-si, KR;
Gun-sik Park, Seoul, KR;
Jong-min Kim, Yongin-si, KR;
Young-min Shin, Seoul, KR;
Jin-kyu So, Seoul, KR;
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Seoul National University Industry Foundation, Seoul, KR;
Abstract
A mask used for a Lithographie, Galvanofomung, and Abformung (LIGA) process, a method for manufacturing the mask, and a method for manufacturing a microstructure using a LIGA process. The method for manufacturing the microstructure using the LIGA process contemplates forming a substrate for the microstructure, a plurality of photosensitive layers, each photosensitive layer having a plating hole and an aligning pinhole, and an aligning pin capable of being inserted into the aligning pinhole, with the aligning pinholes of the photosensitive layers being formed in corresponding positions, and repeating a process of stacking the photosensitive layer on the substrate for the microstructure and a process of forming a plating layer by plating the plating hole of the stacked photosensitive layer with a metal for a number of times corresponding to the number of the photosensitive layers, and when the photosensitive layers are stacked on the substrate for the structure, the photosensitive layers being aligned with one another by inserting the aligning pin into the aligning pinholes of all the photosensitive layers stacked on the substrate for the microstructure to penetrate all the photosensitive layers.