The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2009
Filed:
Apr. 19, 2006
Jung-dae Park, Seoul, KR;
Pil-kwon Jun, Yongin-si, KR;
Myoung-ok Han, Suwon-si, KR;
Se-yeon Kim, Seoul, KR;
Kwang-shin Lim, Yongin-si, KR;
Tae-hyo Choi, Yongin-si, KR;
Seung-ki Chae, Seoul, KR;
Yang-koo Lee, Gwacheon-si, KR;
Jung-Dae Park, Seoul, KR;
Pil-Kwon Jun, Yongin-si, KR;
Myoung-Ok Han, Suwon-si, KR;
Se-Yeon Kim, Seoul, KR;
Kwang-Shin Lim, Yongin-si, KR;
Tae-Hyo Choi, Yongin-si, KR;
Seung-Ki Chae, Seoul, KR;
Yang-Koo Lee, Gwacheon-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Abstract
A composition for removing a photoresist includes about 5 to about 20 percent by weight of an alcoholamide compound, about 15 to about 60 percent by weight of a polar aprotic solvent, about 0.1 to about 6 percent by weight of an additive, and pure water. The alcoholamide compound is chemically structured as follows: where Ris a hydroxyl group or a hydroxyalkyl group, and Ris a hydrogen atom or a hydroxyalkyl group.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile