The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2009
Filed:
Dec. 02, 2004
Antoine P. Manens, Mountain View, CA (US);
Feng Q Liu, San Jose, CA (US);
Paul D. Butterfield, San Jose, CA (US);
Alain Duboust, Sunnyvale, CA (US);
Rashid Mavliev, Campbell, CA (US);
Antoine P. Manens, Mountain View, CA (US);
Feng Q Liu, San Jose, CA (US);
Paul D. Butterfield, San Jose, CA (US);
Alain Duboust, Sunnyvale, CA (US);
Rashid Mavliev, Campbell, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A retaining ring for electrochemical mechanical processing is described. The ring has a conductive portion having an upper surface and a lower surface and an insulating portion. The insulating portion has one or more openings extending therethrough, exposing the lower surface of the conductive portion. An upper surface of the insulating portion contacts the lower surface of the conductive portion. In an electrochemical mechanical polishing process, the retaining ring can be biased separately from a substrate being polished.