The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7604904 B1

PDF
Full Text
Expired
Date of Patent:
Oct. 20, 2009

Filed:

Aug. 25, 2004
Applicant:

Yoshihiko Nagata, Gunma, JP;

Inventor:

Yoshihiko Nagata, Gunma, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

There is disclosed a pellicle for lithography comprising a pellicle film, a pellicle frame to which the pellicle film is adhered, and a sticking layer placed on another end face of the pellicle frame, wherein the pellicle film consists of multi-layer structure of fluorine-doped silica and fluorocarbon resin. Thereby, there is provided a pellicle for lithography which has high transmittance and high light stability against light of short wavelength such as far-ultraviolet light in a range of 200-300 nm and especially vacuum ultraviolet light of 200 nm or less, and is sufficiently practicable.


Find Patent Forward Citations

Nagata, Yoshihiko. (2009). Pellicle for lithography (U.S. Patent No. 7604904). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7604904

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