The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2009
Filed:
Jan. 10, 2006
Rafik Marutyan, Palo Alto, CA (US);
Rafik Marutyan, Palo Alto, CA (US);
Synopsys, Inc., Mountain View, CA (US);
Abstract
Detecting spatial failures in a wafer can be performed quickly and accurately by using transformations and cluster signature analysis. For this technique, a system can receive failure coordinates for the wafer, wherein each failure coordinate indicates a spatial failure. A failure array can be generated based on a resolution of those failure coordinates. A first set of objects, e.g. linear and arc objects, can be detected in the failure array using transformations. A second set of objects, e.g. blob and scratch objects, can be detected in the failure array using cluster signature analysis. This technique advantageously reduces the amount of memory required to perform the analysis and increases the processing speed without increasing the error rate of detection.
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