The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2009
Filed:
Jun. 18, 2008
Roel DE Jonge, Veldhoven, NL;
Roel De Jonge, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithography system including a polarized illumination source, a birefringence-controllable optical element, a birefringence inducer, a pattern generator, a linear polarizer, and a projection system. The polarized illumination source is configured to provide polarized light. The birefringence-controllable optical element is optically coupled to the polarized illumination source. The birefringence inducer is coupled to the birefringence-controllable optical element and configured to induce birefringence on the birefringence-controllable optical element to provide polarization-retarded polarized light. The pattern generator is optically coupled to the birefringence-controllable optical element. The linear polarizer is optically coupled to the pattern generator and configured (i) to receive the polarization-retarded polarized light and (ii) modify intensity distribution of the polarization-retarded polarized light to provide modified polarization-retarded polarized light. The projection system is configured to project the modified polarization-retarded polarized light.