The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2009

Filed:

Oct. 18, 2007
Applicants:

Hisaji Nishimura, Toyama, JP;

Hiroyoshi Ogura, Toyama, JP;

Akira Ohdaira, Toyama, JP;

Inventors:

Hisaji Nishimura, Toyama, JP;

Hiroyoshi Ogura, Toyama, JP;

Akira Ohdaira, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/739 (2006.01); H01L 21/332 (2006.01);
U.S. Cl.
CPC ...
Abstract

A drift diffusion layer of a low concentration is formed so as to surround a collector buffer layer having a relatively high concentration including a high-concentration collector diffusion layer in a plane structure. Thereby, current crowding in corner portions of the high-concentration collector diffusion layer is suppressed while maintaining a short turnoff time, and the improvement of breakdown voltage at on-time is realized.


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