The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2009

Filed:

Mar. 06, 2006
Applicants:

Hyun Soo Roh, Gunpo-si, KR;

Tae Won Park, Suwon-si, KR;

Tae Young Lee, Gunpo-si, KR;

IN Kyung Lee, Euiwang-si, KR;

Chin Ho Lee, Chunan-si, KR;

Young Woo Kim, Chunan-si, KR;

Moon RO Choi, Chunan-si, KR;

Jong Seop Kim, Chunan-si, KR;

Inventors:

Hyun Soo Roh, Gunpo-si, KR;

Tae Won Park, Suwon-si, KR;

Tae Young Lee, Gunpo-si, KR;

In Kyung Lee, Euiwang-si, KR;

Chin Ho Lee, Chunan-si, KR;

Young Woo Kim, Chunan-si, KR;

Moon Ro Choi, Chunan-si, KR;

Jong Seop Kim, Chunan-si, KR;

Assignees:

Cheil Industries, Inc., Gumi-si, Gyeongsangbuk-do, KR;

MEMC Korea Co., Ltd., Chunan-si, Choongcheongnam-do, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09K 13/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A polishing slurry composition including an abrasive, a pH-adjusting agent, a water-soluble thickening agent, and a chelating agent, wherein the chelating agent includes at least one of an acetate chelating agent and a phosphate chelating agent, and a method of using the same.


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