The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2009
Filed:
May. 29, 2007
Hayato Kimura, Shizuoka, JP;
Yujin Handa, Shizuoka, JP;
Seiji Wake, Shizuoka, JP;
Takuya Matsukawa, Shizuoka, JP;
Seiichi Tsuchiya, Shizuoka, JP;
Hayato Kimura, Shizuoka, JP;
Yujin Handa, Shizuoka, JP;
Seiji Wake, Shizuoka, JP;
Takuya Matsukawa, Shizuoka, JP;
Seiichi Tsuchiya, Shizuoka, JP;
NuFlare Technology, Inc., Numazu-shi, JP;
Abstract
A writing error diagnosis method for a charged beam photolithography apparatus and a charged beam photolithography apparatus which can specify an error cause within a short period of time in occurrence of a pattern writing error are provided. The writing error diagnosis method for a charged beam photolithography apparatus is a writing error diagnosis method for a charged beam photolithography apparatus which irradiates a charged beam on a target object to write a desired pattern. Processing result data of a pattern writing circuit at a position where a pattern writing error occurs is collected after the pattern writing error occurs, and the collected processing result data of the pattern writing circuit is compared with correct data. The charged beam photolithography apparatus has means which realizes the diagnosis method.