The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2009
Filed:
Oct. 18, 2007
Hidetaka Sawada, Tokyo, JP;
Fumio Hosokawa, Tokyo, JP;
Hidetaka Sawada, Tokyo, JP;
Fumio Hosokawa, Tokyo, JP;
Jeol Ltd., Tokyo, JP;
Abstract
An aberration for correcting higher-order aberrations with a relatively small number of components is by let N1 being the aberration order at a first location, S1 being the symmetry at the first location, N2 being the aberration order at a second location and S2 being the symmetry at the second location. The produced combination aberration satisfies the following condition setas order=N1+N2−1 and symmetry=|S1+S2| or |S2−S1|. That is two aberration-correcting elements (aberration-introducing elements) corresponding to the first and second locations, respectively. An aberration satisfying the condition setis corrected by making use of the produced combination aberration.