The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2009
Filed:
Mar. 29, 2007
Satoshi Tanaka, Kawasaki, JP;
Shoji Mimotogi, Yokohama, JP;
Takashi Sato, Fujisawa, JP;
Soichi Inoue, Yokohama, JP;
Satoshi Tanaka, Kawasaki, JP;
Shoji Mimotogi, Yokohama, JP;
Takashi Sato, Fujisawa, JP;
Soichi Inoue, Yokohama, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A light intensity distribution simulation method for predicting an intensity distribution of light on a substrate when photomask including a pattern is irradiated with light in which a shape distribution of an effective light source is defined includes extracting plural point light sources from a shape distribution of the effective light source, entering the light emitted from each of the plural point light sources onto the pattern of the photomask, calculating an effective shape for each of the plural point light sources, the effective shape being a pattern obtained by excluding a part which is not irradiated with the light directly due to a sidewall of a pattern film including the pattern from a design shape of an aperture of the pattern, and calculating a distribution of diffraction light generated in the pattern for each of the plural point light sources by using the effective shape.