The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2009
Filed:
Dec. 13, 2006
Hirotami Koike, Tokyo, JP;
Shinichi Okada, Tokyo, JP;
Akira Higuchi, Tokyo, JP;
Masahiro Inoue, Tokyo, JP;
Masahiro Yamamoto, Tokyo, JP;
Sumio Sasaki, Tokyo, JP;
Hirotami Koike, Tokyo, JP;
Shinichi Okada, Tokyo, JP;
Akira Higuchi, Tokyo, JP;
Masahiro Inoue, Tokyo, JP;
Masahiro Yamamoto, Tokyo, JP;
Sumio Sasaki, Tokyo, JP;
Topcon Corporation, Tokyo, JP;
Abstract
The present invention provides a charged particle beam apparatus capable of preventing the charging-up of the specimen without using a large-scale facility. A scanning electron microscopeilluminates a specimenwith a charged particle beam via a charged particle optical system arranged in a column. According to the present invention, the scanning electron microscopehas a charge preventive memberdisposed between the objective lensand the specimen. The charge preventive memberhas an electrically conductive portion and an openingto transmit the charged particle beam. The charge preventive memberis formed so as to partly cover the charged particle optical system when viewed from the charged particle beam irradiation spot on the specimen. In addition, the charge preventive memberhas gas inflow pathsandformed therein. These gas inflow paths have gas injection outletsformed to inject gas toward the charged particle beam irradiation spot on the specimen.