The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2009
Filed:
Oct. 21, 2005
Taketoshi Okajo, Yamanashi, JP;
Taketoshi Okajo, Yamanashi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A processing chamber is partitioned into a processing space and an evacuation space by a partitioning plate having formed therein a plurality of communicating holes. A processing gas supply means for supplying a processing gas into the processing space, a pressure adjusting gas supply means for supplying a pressure adjusting gas to be used to adjust the pressure inside the processing chamber into the evacuation space and a pressure controller are disposed at the processing chamber. When the processing gas is supplied from the processing gas supply means, the pressure controller executes pressure control so as to set the pressure in the processing space to a predetermined level by supplying the pressure adjusting gas from the pressure adjusting gas supply means. As a result, the pressure inside the processing chamber can be controlled without having to control the displacement quantity of the processing chamber or adversely affecting the substrate processing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile