The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2009
Filed:
Sep. 14, 2006
Applicants:
Peng Zhang, Quakertown, PA (US);
Danielle Megan King Curzi, Center Valley, PA (US);
Eugene Joseph Karwacki, Jr., Orefield, PA (US);
Leslie Cox Barber, Cave Creek, AZ (US);
Inventors:
Peng Zhang, Quakertown, PA (US);
Danielle Megan King Curzi, Center Valley, PA (US);
Eugene Joseph Karwacki, Jr., Orefield, PA (US);
Leslie Cox Barber, Cave Creek, AZ (US);
Assignee:
Air Products and Chemicals, Inc., Allentown, PA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/08 (2006.01); C11D 7/32 (2006.01);
U.S. Cl.
CPC ...
Abstract
Process solutions comprising one or more surfactants are used to reduce the number of pattern collapse defects on a plurality of photoresist coated substrates during the manufacture of semiconductor devices.