The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2009

Filed:

Dec. 01, 2005
Applicants:

Shigeki Ohbayashi, Tokyo, JP;

Hiroaki Suzuki, Tokyo, JP;

Koichiro Ishibashi, Tokyo, JP;

Hiroshi Makino, Tokyo, JP;

Inventors:

Shigeki Ohbayashi, Tokyo, JP;

Hiroaki Suzuki, Tokyo, JP;

Koichiro Ishibashi, Tokyo, JP;

Hiroshi Makino, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H03K 19/00 (2006.01); H01L 25/00 (2006.01); H01L 23/62 (2006.01);
U.S. Cl.
CPC ...
Abstract

A CMOS LSI includes an inverter including first and second MOS transistors, a relatively long metal interconnection connected to an input node of the inverter, first and second diodes releasing charges born by the metal interconnection during a plasma process to first and second wells, and first and second MOS transistors maintaining a voltage between the first and second wells at a level not higher than a prescribed voltage. Therefore, even when an antenna ratio is high, a gate oxide film in the first and second MOS transistors is not damaged during the plasma process.


Find Patent Forward Citations

Loading…