The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2009
Filed:
Oct. 04, 2006
Ronald Patrick Huemoeller, Chandler, AZ (US);
Sukianto Rusli, Phoexix, AZ (US);
David Jon Hiner, Chandler, AZ (US);
Nozad Osman Karim, Chandler, AZ (US);
Ronald Patrick Huemoeller, Chandler, AZ (US);
Sukianto Rusli, Phoexix, AZ (US);
David Jon Hiner, Chandler, AZ (US);
Nozad Osman Karim, Chandler, AZ (US);
Amkor Technology, Inc., Chandler, AZ (US);
Abstract
A method and structure for creating embedded metal features includes embedded trace substrates wherein bias and signal traces are embedded in a first surface of the embedded trace substrate and extend into the body of the embedded trace substrate. The bias trace and signal trace trenches are formed into the substrate body using LASER ablation, or other ablation, techniques. Using ablation techniques to form the bias and signal trace trenches allows for extremely accurate control of the depth, width, shape, and horizontal displacement of the bias and signal trace trenches. As a result, the distance between the bias traces and the signal traces eventually formed in the trenches, and therefore the electrical properties, such as impedance and noise shielding, provided by the bias traces, can be very accurately controlled.