The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2009
Filed:
Sep. 09, 2002
Shunpei Yamazaki, Tokyo, JP;
Koichiro Tanaka, Kanagawa, JP;
Hidekazu Miyairi, Kanagawa, JP;
Aiko Shiga, Kanagawa, JP;
Akihisa Shimomura, Kanagawa, JP;
Mai Akiba, Kanagawa, JP;
Shunpei Yamazaki, Tokyo, JP;
Koichiro Tanaka, Kanagawa, JP;
Hidekazu Miyairi, Kanagawa, JP;
Aiko Shiga, Kanagawa, JP;
Akihisa Shimomura, Kanagawa, JP;
Mai Akiba, Kanagawa, JP;
Semiconductor Energy Laboratory Co., Ltd., Kanagawa-Ken, JP;
Abstract
Continuous wave laser apparatus with enhanced processing efficiency is provided as well as a method of manufacturing a semiconductor device using the laser apparatus. The laser apparatus has: a laser oscillator; a unit for rotating a process object; a unit for moving the center of the rotation along a straight line; and an optical system for processing laser light that is outputted from the laser oscillator to irradiate with the laser light a certain region within the moving range of the process object. The laser apparatus is characterized in that the certain region is on a line extended from the straight line and that the position at which the certain region overlaps the process object is moved by rotating the process object while moving the center of the rotation along the straight line.