The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2009
Filed:
Jun. 27, 2005
Satoru Kamitani, Kirishima, JP;
Kiyoshi Yokoyama, Kirishima, JP;
Satoru Kamitani, Kirishima, JP;
Kiyoshi Yokoyama, Kirishima, JP;
Kyocera Corporation, Kyoto, JP;
Abstract
An electrostatic chuck having a good soaking feature and allowing a wafer to reach a saturation temperature quickly is provided. The chuck, which has a platy body with a pair of main surfaces, one main surface being used as a mounting surface for mounting a wafer, and an attracting electrode on the other main surface or inside the body, has at least one gas introducing through hole formed so as to pass through the body, a gas flow path formed in the mounting surface by a plurality of mutually separated protrusions and formed so as to communicate with the through hole, and an annular wall portion formed on the outer periphery of the body, characterized in that the planar shape of each of the above protrusions consists of four sides and arc-shaped portions connecting the four sides, and the above protrusions are uniformly arranged on the mounting surface.