The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 08, 2009

Filed:

Oct. 02, 2006
Applicants:

Jae-man Yoon, Seoul, KR;

Dong-gun Park, Seongnam-si, KR;

Kang-yoon Lee, Seongnam-si, KR;

Choong-ho Lee, Seongnam-si, KR;

Bong-soo Kim, Seongnam-si, KR;

Seong-goo Kim, Seoul, KR;

Hyeoung-won Seo, Yongin-si, KR;

Seung-bae Park, Suwon-si, KR;

Inventors:

Jae-man Yoon, Seoul, KR;

Dong-gun Park, Seongnam-si, KR;

Kang-yoon Lee, Seongnam-si, KR;

Choong-ho Lee, Seongnam-si, KR;

Bong-soo Kim, Seongnam-si, KR;

Seong-goo Kim, Seoul, KR;

Hyeoung-won Seo, Yongin-si, KR;

Seung-bae Park, Suwon-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/528 (2006.01); H01L 27/108 (2006.01);
U.S. Cl.
CPC ...
Abstract

A circuit device including vertical transistors connected to buried bitlines and a method of manufacturing the circuit device. The circuit device includes a semiconductor substrate including a peripheral circuit region and left and right cell regions at both sides of the peripheral circuit region, bottom active regions arranged on the semiconductor substrate to be spaced apart from one another in a column direction and to extend from the peripheral circuit region alternately to the left cell region and the right cell region in a row direction, channel pillars protruding from the bottom active regions in a vertical direction and arranged to be aligned in the row direction and spaced apart from one another, gate electrodes provided with a gate dielectric layer and attached to surround side surfaces of the channel pillars, and buried bitlines extending along the bottom active regions, the bottom active regions including a bottom source/drain region.


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