The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2009
Filed:
Oct. 26, 2004
Vidya Venkatachalam, Bellevue, WA (US);
Vidya Venkatachalam, Bellevue, WA (US);
Mitutoyo Corporation, Kawaski-shi, JP;
Abstract
A structured morphology filtering method is disclosed for filtering an image for high precision machine vision metrology using specifically-determined structuring elements to precisely preserve the location of specific features in the filtered image. A selected structuring element shape generally exhibits geometric similarity with at least a portion of the feature to be preserved in the filtered image. The structuring element may be oriented to corresponds to the orientation of the feature to be inspected. For example, for a linear feature to be inspected, the optimal structuring element is a line or narrow rectangle at the same orientation, while for images of circles, it is a circle. The orientation of the structuring element may be determined or adjusted automatically during a set of automatic inspection operations, based on an automatic determination of the orientation of the feature to be inspected.