The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2009
Filed:
Aug. 16, 2006
Tomonori Sekiguchi, Tokyo, JP;
Toshihiko Tanaka, Tokyo, JP;
Toshiaki Yamanaka, Saitama, JP;
Takeshi Sakata, Tokyo, JP;
Katsutaka Kimura, Tokyo, JP;
Tomonori Sekiguchi, Tokyo, JP;
Toshihiko Tanaka, Tokyo, JP;
Toshiaki Yamanaka, Saitama, JP;
Takeshi Sakata, Tokyo, JP;
Katsutaka Kimura, Tokyo, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
In a masking pattern (a) for patterning word and data lines, length is changed between adjacent word lines so as to be shifted from each other at their tips, and furthermore, the tip of each word line is cut obliquely. It is thus possible to prevent the resist pattern from separation and contact of adjacent patterns. Consequently, it is also possible to prevent break failures of patterned lines and short failures between those patterned lines.