The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2009
Filed:
Nov. 20, 2003
James F. Cameron, Cambridge, MA (US);
Dana A. Gronbeck, Holliston, MA (US);
George G. Barclay, Jefferson, MA (US);
James F. Cameron, Cambridge, MA (US);
Dana A. Gronbeck, Holliston, MA (US);
George G. Barclay, Jefferson, MA (US);
Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);
Abstract
Multilayer photoresist systems are provided. In particular aspects, the invention relates to underlayer composition for an overcoated photoresist, particularly an overcoated silicon-containing photoresist. Preferred underlayer compositions comprise one or more resins or other components that impart etch-resistant and antireflective properties, such as one or more resins that contain phenyl or other etch-resistant groups and anthracene or other moieties that are effective anti-reflective chromophores for photoresist exposure radiation.