The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2009
Filed:
Aug. 29, 2006
Nobuyuki Matsuzawa, Tokyo, JP;
Yoko Watanabe, Kanagawa, JP;
Boontarika Thunnakart, Kanagawa, JP;
Ken Ozawa, Kanagawa, JP;
Nobuyuki Matsuzawa, Tokyo, JP;
Yoko Watanabe, Kanagawa, JP;
Boontarika Thunnakart, Kanagawa, JP;
Ken Ozawa, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
An antireflective film is provided between a resist layer and a silicon oxide layer formed on a surface of a silicon substrate, for exposure of the resist layer in an exposure system having a wavelength of 190 nm to 195 nm and a numerical aperture NA of 0.93 to 1.2. Assuming that the complex refractive indexes of upper and lower layers constituting the antireflective film are N(=n−ki) and N(=n−ki), respectively, and the thicknesses of both layers are dand d, when a predetermined combination of values of [n, k, d, n, k, d] is selected, n, k, d, n, k, and dsatisfy the relational expression{()/()}+{()/()}+{()/()}+{()/()}+{()/()}+{()/()}≦1.