The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2009
Filed:
May. 06, 2005
Spencer D. Dreher, Metuchen, NJ (US);
Norihiro Ikemoto, Edison, NJ (US);
C. Scott Shultz, Maplewood, NJ (US);
J. Michael Williams, Hillsborough, NJ (US);
Spencer D. Dreher, Metuchen, NJ (US);
Norihiro Ikemoto, Edison, NJ (US);
C. Scott Shultz, Maplewood, NJ (US);
J. Michael Williams, Hillsborough, NJ (US);
Merck & Co., Inc., Rahway, NJ (US);
Abstract
This invention relates to a process for preparing optically active α-amino acid substrates which are used to make potent lethal factor (LF) inhibitors for the treatment of anthrax. This invention further relates to a process for synthesis of potent LF-inhibitors for the treatment of anthrax. Specifically, the invention concerns a novel, high-yielding and highly enantioselective asymmetric hydrogenation reaction of a tetrasubstituted ene-sulfonamide acid or ester.