The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2009
Filed:
Aug. 10, 2007
Robin Wilson, Holywood, GB;
Conor Brogan, Belfast, GB;
Hugh J. Griffin, Newtownabbey, GB;
Cormac Macnamara, Belfast, GB;
Robin Wilson, Holywood, GB;
Conor Brogan, Belfast, GB;
Hugh J. Griffin, Newtownabbey, GB;
Cormac MacNamara, Belfast, GB;
Icemos Technology Ltd., Belfast, Northern Ireland, GB;
Abstract
A method for manufacturing a photodiode array includes providing a semiconductor substrate having first and second main surfaces opposite to each other. The semiconductor substrate has a first layer of a first conductivity proximate the first main surface and a second layer of a second conductivity proximate the second main surface. A via is formed in the substrate which extends to a first depth position relative to the first main surface. The via has a first aspect ratio. Generally simultaneously with forming the via, an isolation trench is formed in the substrate spaced apart from the via which extends to a second depth position relative to the first main surface. The isolation trench has a second aspect ratio different from the first aspect ratio.