The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2009

Filed:

Nov. 07, 2005
Applicants:

Gary J. Brand, St. James, MO (US);

Philip H. Allen, Rolla, MO (US);

Ramachandran K. Trichur, Rolla, MO (US);

Inventors:

Gary J. Brand, St. James, MO (US);

Philip H. Allen, Rolla, MO (US);

Ramachandran K. Trichur, Rolla, MO (US);

Assignee:

Brewer Science Inc., Rolla, MO (US);

Attorney:
Int. Cl.
CPC ...
B05D 7/00 (2006.01); B05D 3/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

New baffles and methods of using these baffles are provided. The baffles comprise a body having an edge wall configured to direct the flow of a composition against a substrate (e.g., silicon wafer) edge. The edge wall comprises a vertical surface, a curved sidewall coupled to the vertical surface, and a lip coupled to the curved sidewall. A preferred baffle is annular in shape and formed from a synthetic resinous composition. Even more preferably, the baffle is not formed of a metal. The inventive methods comprise positioning the baffle adjacent a substrate during a spin coating process so that the edge wall causes the composition to cover the edges of the substrate and preferably a portion of the back side of the substrate.


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