The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2009
Filed:
Mar. 30, 2007
Hong Shih, Walnut, CA (US);
Yaobo Yin, Pleasanton, CA (US);
Shun Jackson Wu, Cupertino, CA (US);
Armen Avoyan, Glendale, CA (US);
John E. Daugherty, Newark, CA (US);
Linda Jiang, Milpitas, CA (US);
Hong Shih, Walnut, CA (US);
Yaobo Yin, Pleasanton, CA (US);
Shun Jackson Wu, Cupertino, CA (US);
Armen Avoyan, Glendale, CA (US);
John E. Daugherty, Newark, CA (US);
Linda Jiang, Milpitas, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
Systematic and effective methodology to clean capacitively coupled plasma reactor electrodes and reduce surface roughness so that the cleaned electrodes meet surface contamination specifications and manufacturing yields are enhanced. Pre-cleaning of tools used in the cleaning process helps prevent contamination of the electrode being cleaned.