The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2009
Filed:
Oct. 19, 2005
Yoshio Terada, Ibaraki, JP;
Hirofumi Fujii, Ibaraki, JP;
Makoto Namikawa, Ibaraki, JP;
Daisuke Uenda, Ibaraki, JP;
Yasuhiro Amano, Ibaraki, JP;
Yoshio Terada, Ibaraki, JP;
Hirofumi Fujii, Ibaraki, JP;
Makoto Namikawa, Ibaraki, JP;
Daisuke Uenda, Ibaraki, JP;
Yasuhiro Amano, Ibaraki, JP;
Nitto Denko Corporation, Osaka, JP;
Abstract
The present invention provides a cleaning substrate of a substrate processing equipment, which comprises a cleaning layer comprising a heat resistant resin with a storage modulus (1 Hz) at 20° C. up to 150° C. being 5×10Pa to 1×10Pa on at least one face of the substrate; and a polyimide resin suitable as the heat resistant resin for the cleaning layer and usable under circumstances possibly involving the generation of serious disadvantages due to silicone contamination, such as for HDD application and some semiconductor applications.