The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2009
Filed:
Dec. 07, 2005
Charles H. Wallace, Portland, OR (US);
Shannon E. Daviess, Hillsboro, OR (US);
Swaminathan Sivakumar, Portland, OR (US);
Charles H. Wallace, Portland, OR (US);
Shannon E. Daviess, Hillsboro, OR (US);
Swaminathan Sivakumar, Portland, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
Sub-resolution assist features for non-collinear features are described for use in photolithography. A photolithography mask with elongated features is synthesized. An end-to-end gap between two features if found for which the ends of the two features facing the gap are linearly offset from one another. A sub-resolution assist feature is applied to the end-to-end gap between the elongated features, and the synthesized photolithography mask is modified to include the sub-resolution assist feature.