The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2009

Filed:

Jul. 17, 2006
Applicants:

Wolfgang Pannhorst, Mainz, DE;

Ulf Dahlmann, Mainz, DE;

Ulrich Fotheringham, Wiesbaden, DE;

Juergen Leib, Freising, DE;

Rainer Liebald, Nauheim, DE;

Inventors:

Wolfgang Pannhorst, Mainz, DE;

Ulf Dahlmann, Mainz, DE;

Ulrich Fotheringham, Wiesbaden, DE;

Juergen Leib, Freising, DE;

Rainer Liebald, Nauheim, DE;

Assignee:

Schott AG, Mainz, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03C 3/097 (2006.01); C03C 3/089 (2006.01); C03C 17/00 (2006.01); C03C 21/00 (2006.01); C03C 23/00 (2006.01); C03C 25/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The glass is advantageous for microstructuring, especially reactive ion etching with fluorine and fluorine compounds, and has a glass composition based on oxide content and expressed in mol % of: SiO, 40-70; GeO, 0-30; BO, 5-20; PO, 5-20; WO, 0-10; AsO, 0-10; YbO, 0-5; and LuO, 0-5. Microstructure components, such as micro arrays, Fresnel lenses, micro wafers, or micro lens wafers, made by a method including reactive ion etching from the glass are also part of the present invention.


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