The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2009
Filed:
Feb. 01, 2007
Akira Shimizu, Nara, JP;
Yuhsuke Fukuoka, Nara, JP;
Yasushi Fujioka, Kyoto, JP;
Katsushi Kishimoto, Kyoto, JP;
Katsuhiko Nomoto, Osaka, JP;
Akira Shimizu, Nara, JP;
Yuhsuke Fukuoka, Nara, JP;
Yasushi Fujioka, Kyoto, JP;
Katsushi Kishimoto, Kyoto, JP;
Katsuhiko Nomoto, Osaka, JP;
Sharp Kabushiki Kaisha, Osaka, JP;
Abstract
A plasma CVD apparatus comprises an anode electrode and a cathode electrode, and is for forming a thin film on a substrate by performing plasma discharge between the anode electrode and the cathode electrode, comprising: a substrate holder disposed between the anode electrode and the cathode electrode; and one conductive member disposed between the substrate holder and one electrode of either the anode electrode or the cathode electrode, wherein the substrate holder supports the substrate, the one conductive member is provided between the one electrode and the substrate holder so as to substantially cover an entire space between the one electrode and the substrate holder, and the one conductive member is electrically connected to the one electrode and the substrate holder.