The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2009
Filed:
Sep. 25, 2007
Chih-chao Yang, Poughkeepsie, NY (US);
Lawrence A. Clevenger, La Grangeville, NY (US);
Andrew P. Cowley, Wappingers Falls, NY (US);
Timothy J. Dalton, Ridgefield, CT (US);
Meeyoung H. Yoon, Hopewell Junction, NY (US);
Chih-Chao Yang, Poughkeepsie, NY (US);
Lawrence A. Clevenger, La Grangeville, NY (US);
Andrew P. Cowley, Wappingers Falls, NY (US);
Timothy J. Dalton, Ridgefield, CT (US);
Meeyoung H. Yoon, Hopewell Junction, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method of forming a damascene wire. The method including: forming a mask layer on a top surface of a dielectric layer; forming an opening in the mask layer; forming a trench in the dielectric layer where the dielectric layer is not protected by the mask layer; recessing the sidewalls of the trench under the mask layer; forming a conformal conductive liner on all exposed surface of the trench and the mask layer; filling the trench with a core electrical conductor; removing portions of the conductive liner extending above the top surface of the dielectric layer and removing the mask layer; and forming a conductive cap on a top surface of the core conductor.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile