The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2009
Filed:
Mar. 17, 2004
Applicants:
Gary Escher, Hampstead, NH (US);
Mark A. Allen, Essex, MA (US);
Yasuhisa Kudo, Tokyo, JP;
Inventors:
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/4763 (2006.01); H01L 21/311 (2006.01); G06F 19/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Two or more coatings applied to processing elements of a plasma processing system are treated with protective barriers or coatings. A method is described for adjoining two or more coatings on the processing element. Having applied a first protective barrier, a portion of the first protective barrier is treated. A second protective barrier is then applied over at least a portion of a region to which the first protective barrier was applied.