The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2009
Filed:
Sep. 22, 2004
Applicants:
Hongxin Fang, Hong Kong, CN;
Hongtao MA, Dongguan, CN;
Baiqing Zhang, Dongguan, CN;
Baohua Chen, Dongguan, CN;
Somen Choudhury, Hong Kong, CN;
Inventors:
Hongxin Fang, Hong Kong, CN;
Hongtao Ma, Dongguan, CN;
Baiqing Zhang, Dongguan, CN;
Baohua Chen, Dongguan, CN;
Somen Choudhury, Hong Kong, CN;
Assignee:
SAE Magnetics (H.K.) Ltd., Kwai Chung, N.T., Hong Kong, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); C23F 1/00 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A thin-film forming method, which includes the steps of: (1) holding at least one object in a chamber; (2) depositing a film-forming material on the object; (3) etching the forming material while depositing is conducted. In the present invention, the depositing and etching are controlled to simultaneously conduct. The invention also disclose a system for performing the method.