The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2009
Filed:
Mar. 28, 2003
John Donohue, Farmington, NM (US);
John Donohue, Farmington, NM (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
The present invention describes a system and method for monitoring a material film within a plasma processing device. The system includes a plasma reactor formed by a reactor wall and an electrode, a RF generator to couple electrical energy to the electrode, an electrical measurement device for measuring an electrical property of the plasma processing device, and a controller coupled to the electrical measurement device and programmed to determine a state of a film on the reactor wall based on the measured electrical property.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile