The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2009
Filed:
Jul. 31, 2004
David Ziger, San Antonio, TX (US);
Pierre Leroux, San Antonio, TX (US);
David Ziger, San Antonio, TX (US);
Pierre Leroux, San Antonio, TX (US);
NXP B.V., Eindhoven, NL;
Abstract
In photo-lithography, one may assess the effect of flare due to various exposure tools. In an example embodiment, in a photo-lithography process on a photo resist coated substrate, there is a method () for determining the effect of flare on line shortening. The method () comprises, at a first die position on the substrate and in a first exposure, printing a first mask () that includes a flare pattern () corresponding to one corner of the first mask (), and in a second exposure, printing a second mask () that includes another flare pattern corresponding to an opposite corner of the second mask. At a second die position on the substrate, a composite mask pattern () based on features of the first mask and the second is printed. The printed patterns () are developed and measurements () are obtained therefrom. The effect of flare () is determined as a function of the measurements.