The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 30, 2009

Filed:

May. 11, 2004
Applicants:

Hamza Yilmaz, Saratoga, CA (US);

Anthony Chia, Singapore, SG;

Xiaoguang Zeng, Shanghai, CN;

Wong Hie Ming, Singapore, SG;

Liming Wang, Shanghai, CN;

Yiju Zhang, Shanghai, CN;

Inventors:

Hamza Yilmaz, Saratoga, CA (US);

Anthony Chia, Singapore, SG;

Xiaoguang Zeng, Shanghai, CN;

Wong Hie Ming, Singapore, SG;

Liming Wang, Shanghai, CN;

Yiju Zhang, Shanghai, CN;

Assignee:

GEM Services, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01);
U.S. Cl.
CPC ...
Abstract

Singulation of individual electronic packages fabricated as part of a common matrix, is accomplished by mask patterning and chemical exposure in combination with physical sawing. In one embodiment of a singulation process in accordance with the present invention, an initial, shallow saw cut into inter-package regions of the matrix exposes underlying metal to subsequent chemical etching steps. In an alternative embodiment, a separate photoresist mask may be patterned over the matrix to selectively expose metal in inter-package regions to chemical etching.


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