The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2009
Filed:
Jul. 26, 2007
Koichiro Takeuchi, Hitachinaka, JP;
Tohru Ishitani, Hitachinaka, JP;
Koichiro Takeuchi, Hitachinaka, JP;
Tohru Ishitani, Hitachinaka, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A focused ion beam apparatus enables an ion beam to be focused highly accurately on a sample at the beam spot position of the case of the absence of magnetic field without causing isotope separation of the ion beam on the sample, even when there is a magnetic field on the ion beam optical axis or the magnetic field fluctuates. The focused ion beam apparatus comprises a corrective magnetic field generating unitdisposed on the optical axis of the ion beamfor correcting the deflection of the ion beamdue to an external magnetic field. The corrective magnetic field generating unitincludes pole-piece pairsA andB, each of which having two pole piecesandorandthat are adjacent to each other with a gap d. The pole-piece pairsA andB are disposed opposite to each other with a gap g (>d) across the optical axis of the ion beam. Each of the pole piecestois wound with an internal coil, and the pole-piece pairsA andB are each wound with an external coilin such a manner as to surround the internal coils