The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2009
Filed:
Apr. 12, 2006
Patricia Argandona, Poughkeepsie, NY (US);
Faisal Azam, Fishkill, NY (US);
Andrew LU, Poughkeepsie, NY (US);
Helen Wang, LaGrangeville, NY (US);
Patricia Argandona, Poughkeepsie, NY (US);
Faisal Azam, Fishkill, NY (US);
Andrew Lu, Poughkeepsie, NY (US);
Helen Wang, LaGrangeville, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Method for measuring misalignment between at least two layers of an integrated circuit. The method includes applying a current between a plurality of probe members in a first layer, wherein a first probe member and a second probe member of the plurality of probe members are substantially aligned along a first axis and partially overlap an overlay target in a second layer, measuring a voltage across the plurality of probe members wherein at least a voltage across the first probe member and a third probe member disposed perpendicular to the first axis and a voltage across the second probe member and the third probe member are measured, and determining an amount of misalignment between the first layer and the second layer along at least one of the first axis and the second axis based on the measuring steps.