The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2009
Filed:
Jan. 23, 2007
Applicants:
Quancheng Gu, Fremont, CA (US);
Cheng-hsiung Tsai, Cupertino, CA (US);
John C. Forster, San Francisco, CA (US);
Xiaoxi Guo, San Jose, CA (US);
Larry Frazier, Brentwood, CA (US);
Inventors:
Quancheng Gu, Fremont, CA (US);
Cheng-Hsiung Tsai, Cupertino, CA (US);
John C. Forster, San Francisco, CA (US);
Xiaoxi Guo, San Jose, CA (US);
Larry Frazier, Brentwood, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); B08B 9/00 (2006.01); C25F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for in-situ cleaning of a dielectric dome surface having been used in pre-clean processes is provided. Carbon containing deposits are removed by providing a plasma of one or more oxidizing gases which react with the carbon containing films to form volatile carbon containing compounds.