The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2009
Filed:
May. 15, 2007
Applicant:
Klaus Rinn, Heuchelheim, DE;
Inventor:
Klaus Rinn, Heuchelheim, DE;
Assignee:
Vistec Semiconductor Systems GmbH, Weilburg, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for the high-precision measurement of coordinates on a substrate is disclosed. The substrate is placed on a stage moveable in X/Y coordinate directions. First, a plurality of images of a structure on a substrate are imaged by means of a 2-dimensional detector during the relative movement of a measuring objective in Z coordinate direction and the simultaneous movement of the stage in X and Y coordinate directions.
Rinn, Klaus. (2009). Method for enhancing the measuring accuracy when determining the coordinates of structures on a substrate (U.S. Patent No. 7548321). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7548321
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile