The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2009
Filed:
Jul. 27, 2006
Applicant:
Hermanus Gerardus Van Horssen, Maasbracht, NL;
Inventor:
Hermanus Gerardus Van Horssen, Maasbracht, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G01J 4/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A system and method are used to compensate for critical dimension non-uniformity caused by different polarization directions in an illumination beam. A system comprises a source of radiation and an optical system. The source of radiation produces a beam of radiation. The optical system is configured to transmit a first portion of the beam having a first polarization direction during a first portion of a cycle and a second portion of the beam having a second polarization direction during a second portion of the cycle.