The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 16, 2009

Filed:

Mar. 25, 2005
Applicants:

Satoshi Asari, Tokyo-to, JP;

Katsuhiko Mihara, Tokyo-to, JP;

Hiroshi Kikuchi, Tokyo-to, JP;

Inventors:

Satoshi Asari, Tokyo-to, JP;

Katsuhiko Mihara, Tokyo-to, JP;

Hiroshi Kikuchi, Tokyo-to, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F27D 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A transfer mechanismof a vertical heat treatment systemincludes a base capable of vertical movement and turning movement, and plural substrate support devices, disposed on the base so as to be movable anteroposterior, that hold wafers W. Provided on the baseis a first sensorthat emits a light beam directed toward a direction in which the substrate support devicemoves anteroposterior, and detects the target member upon receipt of a reflected light of the light beam. Provided on two tip end portions of the substrate support deviceis a second sensorthat detects the target member upon interruption of a light beam traveling between the tip end portions by the target member. When a target memberprovided at its specific positions with projectionsandis placed at a position in a wafer boatthe basemoves vertically and turns, and the substrate support devicemoves anteroposterior. The position of the target member, or the transfer target position of the wafer, is automatically detected based on the detection signals of the first sensorand the second sensor obtained at the time and encoder values of drive systems relating to the movement of the baseand the substrate support member


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