The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2009
Filed:
Dec. 17, 2004
Wolfgang Singer, Aalen, DE;
Markus Deguenther, Aalen, DE;
Birgit Kuerz, Aalen, DE;
Rafael Egger, Aalen, DE;
Johannes Wangler, Koenigsbronn, DE;
Manfred Maul, Aalen, DE;
Wolfgang Singer, Aalen, DE;
Markus Deguenther, Aalen, DE;
Birgit Kuerz, Aalen, DE;
Rafael Egger, Aalen, DE;
Johannes Wangler, Koenigsbronn, DE;
Manfred Maul, Aalen, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
A beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus includes a first beam reshaping element having a first beam reshaping surface and a second beam reshaping element having a second beam reshaping surface which faces the first beam reshaping surface. The two beam reshaping surfaces are rotationally symmetrical with respect to an optical axis of the beam reshaping unit. At least the first beam reshaping surface has a concavely or convexly curved region.