The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 02, 2009

Filed:

Jul. 03, 2007
Applicants:

Shahin Zangooie, Hopewell Junction, NY (US);

Lin Zhou, LaGrangeville, NY (US);

Roger M. Young, Warwick, NY (US);

Clemente Bottini, Marlboro, NY (US);

Robert J. Foster, Stormville, NY (US);

Ronald D. Fiege, Hopewell Junction, NY (US);

Inventors:

Shahin Zangooie, Hopewell Junction, NY (US);

Lin Zhou, LaGrangeville, NY (US);

Roger M. Young, Warwick, NY (US);

Clemente Bottini, Marlboro, NY (US);

Robert J. Foster, Stormville, NY (US);

Ronald D. Fiege, Hopewell Junction, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/01 (2006.01); G01J 4/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A sample stage for performing measurements using an optical metrology system includes at least one sample section for retention of a sample, and components for controlling orientation of the sample section with relation to the optical metrology system. A method and a computer program product are provided.


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