The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2009
Filed:
Jan. 07, 2005
Ken Harada, Wako, JP;
Tetsuya Akashi, Fujimi, JP;
Yoshihiko Togawa, Wako, JP;
Tsuyoshi Matsuda, Wako, JP;
Noboru Moriya, Wako, JP;
Ken Harada, Wako, JP;
Tetsuya Akashi, Fujimi, JP;
Yoshihiko Togawa, Wako, JP;
Tsuyoshi Matsuda, Wako, JP;
Noboru Moriya, Wako, JP;
Riken, Saitama, JP;
Abstract
The present invention provides a technique enabling to control fringe spacing s and an interference width W independently of each other, which are important parameters for an interferometer using an electron biprism. In the present invention, two electron biprismsare used in two stages along the optical axis, and fringe spacing s and an interference width W are controlled independently of each other by controlling a voltage applied to an electrode of each of the electron biprisms. Also Fresnel diffraction can be suppressed.