The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2009
Filed:
Dec. 28, 2006
Applicants:
Kyoung Bong Rouh, Gyeonggi-do, KR;
Min Yong Lee, Seoul, KR;
Yong Soo Joung, Seoul, KR;
Inventors:
Assignee:
Hynix Semiconductor Inc., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01); H01L 21/425 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for fabricating a metal oxide semiconductor (MOS) transistor comprises forming a source region of a first conductivity type and a drain region of the first conductivity type, which are separated from each other by a channel region, in upper regions of a semiconductor substrate, forming a gate stack on the channel region, and feeding hydrogen into junctions of the source and drain regions to neutralize dopants of the first conductivity type present within particular portions of the junctions.