The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2009
Filed:
Nov. 10, 2004
Masafumi Ishiyama, Singapore, SG;
Kenji Ayama, Singapore, SG;
Masafumi Ishiyama, Singapore, SG;
Kenji Ayama, Singapore, SG;
Hoya Corporation, Tokyo, JP;
Hoya Magnetics Singapore Pte. Ltd., Singapore, SG;
Abstract
A protection layer containing carbon as a major component is deposited by plasma CVD. The protection layer has film quality such that, when a spectrum is obtained by excluding photoluminescence from a Raman spectrum in a wavenumber band from 900 cmto 1800 cmobtained by exciting the protection layer with an argon ion laser beam having a wavelength of 514.5 nm and the spectrum is subjected to waveform separation by the Gaussian function to split a D peak appearing around 1350 cmand a G peak appearing around 1520 cm, the ratio Dw/Gw between a half width Dw of the D peak and a half width Gw of the G peak exceeds 0 and is not greater than 2.7.