The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2009
Filed:
Oct. 21, 2004
Applicants:
Ming-jiunn Lai, Taichung, TW;
Jeng-hua Wei, Taipei, TW;
Hung-hsiang Wang, Taipei, TW;
Po-yuan Lo, Taipei, TW;
Ming-jer Kao, Tainan, TW;
Inventors:
Ming-Jiunn Lai, Taichung, TW;
Jeng-Hua Wei, Taipei, TW;
Hung-Hsiang Wang, Taipei, TW;
Po-Yuan Lo, Taipei, TW;
Ming-Jer Kao, Tainan, TW;
Assignee:
Industrial Technology Research Institute, Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
Abstract
A metal nanoline process and applications on growth of aligned nanostructures thereof. A nano-structure is provided with a substrate with at least one nanodimensional metal catalyst line disposed thereon and at least one carbon nanotube or silicon nanowire extending along an end of the metal catalyst line.